AttribuéAttributionFournitures🇪🇺 Financement UETED 99/2026
Advanced Lithography EUV Scanner
Acheteur
Publication (JOUE)
22 mai 2026
Valeur estimée
— – 0 €
Type de procédure
Négociée sans appel à la concurrence
Offres reçues
1 offres reçues
Siège de l'acheteur
Heverlee (3001) — BE242
Secteur
Description
The Low NA scanner is a state-of-the-art EUV scanner enabling exploration and further expansion of the EUV patterning, using exploratory materials and novel designs, in the logic and memory devices. Next to the resolution the low NA-scanner can give the improved overlay performance and throughput are crucial for the continuous evolving semiconductor devices.
Codes CPV
38000000
Lots (1)
LOT-0001JPA2026ID53 - 1
Advanced Lithography EUV Scanner
38000000
Critères d'attribution
Zie besteksdocumenten
Lauréat du marché
ASML NL
nl
0 €RES-0001